TAU – EE fablab process
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General Description |
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AZ 5214E |
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lithography |
Author: Moti Ben-David |
Date: 06/12/2005 |
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Comments: |
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Process |
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Singe |
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120 deg 5min |
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Spin |
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250 rpm/sec to 2000 rpm 40 sec |
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Pre bake |
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110 deg 2 min |
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Exposure |
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1.2 sec (MA–6) |
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Reversal bake |
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120 deg 2min |
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Flood exposure |
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60sec (MA-6) |
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Develop |
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AZ726MIF 25 sec |
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Rinse |
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DI Water |
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Post bake |
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120 deg 2min |
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General Description |
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Thickness |
2.5 mm |
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