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Cr/Au
Sputtering |
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Objective: |
Author: Itsik Kalifa |
Date: |
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Comments: |
Sputtering MRC 8620 |
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Process |
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Pump |
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Fore Vacuum |
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High Vacuum |
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Pressure on sputter |
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Cr Sputtering |
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Head |
1 |
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Gas |
Ar |
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FWB |
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REF |
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UP |
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Input |
98(85) |
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Bias |
84(75) |
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Load |
81(25) |
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Time |
40sec |
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Thickness |
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Au Sputtering |
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Head |
2 |
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Gas |
Ar |
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FWB |
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REF |
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UP |
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Input |
98(85) |
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Bias |
84(75) |
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Load |
81(7) |
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Time |
120sec |
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Thickness |
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