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General Description |
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S1818 |
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Objective: |
Author: Yael Hanein |
Date: |
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Comments: |
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Process |
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Singe |
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Comments: Mask aligner: 11 mW/cm2 |
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170 deg, 5 min |
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Spin |
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100 rpm/sec to 2500 rpm 40 sec |
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Pre bake |
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100 deg 2 min |
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Exposure |
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20 sec |
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Develop |
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MF319, 40 sec |
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Rinse |
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DI Water |
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Post bake |
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100 deg 5 min |
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General Description |
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Thickness |
2.6 mm |
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