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General
Description |
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SU8-2002 |
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Objective: |
Author: Itsik Kalifa |
Date: |
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Comments: |
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Process |
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Singe |
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Comments: Mask aligner: 11.7 mW/cm2 |
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170 deg, 5 min |
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Spin |
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100 rpm/sec to 400 rpm 10sec |
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300 rpm/sec to 4000 rpm 30 sec |
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Pre bake |
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65 deg to 95 deg 4.5 min |
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Relax |
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4 min |
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Exposure |
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6 sec |
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Relax |
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4 min |
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Post bake |
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65 deg to 95 deg 4.5 min |
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Develop |
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1 min in SU8 developer-EC solvent |
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Rinse |
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IPA |
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General
Description |
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Thickness |
2 mm |
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