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General Description |
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SU8-2015 |
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Objective: molding master |
Author: Tamir Gabay |
Date: 7/7/2004 |
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Comments: |
tamir@tamar.tau.ac.il |
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Process |
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Dehydrate |
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150 deg for 5 min |
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Spin |
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Comments: Mask Aligner: 11 mW/cm2 |
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100 rpm/sec to 500 rpm 10 sec |
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300 rpm/sec to 3000 rpm 30 sec |
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Pre bake |
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65 deg 1 min |
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95 deg 2 min |
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Remove substrate from hot plate during T ramp |
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Exposure |
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16 sec |
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Post bake |
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65 deg 1 min |
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95 deg 2 min |
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Remove substrate from hot plate during T ramp |
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Develop |
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3 min in Shipley EC developer |
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Rinse |
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IPA+Dry with Nitrogen |
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General Description |
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Thickness |
14 mm |
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