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Journal of Microwave Power
and Electromagnetic Energy (JMPEE) |
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TITLE |
Automatic Microwave Tuner
for Plasma Deposition Applications Using a Gradient Search Method [PDF] |
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AUTHORS |
A. Chtcherbakov
and R L. Swart 1997 32 1 28-33 |
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Abstract This paper describes a practical
realization of an automatic microwave matching unit for an
electron cyclotron resonance plasma enhanced chemical vapor deposition system. The matching unit includes a
waveguide section with three screw stubs controlled by stepper motors. By
using only information about the reflected power, a matching algorithm based
on the method of steepest descent moves the stubs in such a way as to
minimize the reflected power. The same program controls gas flows, magnetic
field and forward microwave power to enable growth of dielectric layers of
the desired composition profile for optical applications. Key Words: Impedance matching,
Plasma, Chemical vapor deposition, Three-stub tuner
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