[Raymond (Reuven) Boxman's photo]
Prof. Raymond (Reuven) Boxman, Director Electrical Discharge and Plasma Laboratory

Department of Interdisciplinary Studies
The Iby and Aladar Fleischman Faculty of Engineering,
Tel Aviv University
Ramat Aviv 69978
ISRAEL
Phone: 972-3-640 7364
Fax: 972-3-641 0189
Mail:boxman@eng.tau.ac.il

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Research Interests:

Electrical Discharges and Plasmas -- Basic Physics and Applications
Vacuum Arc Physics -- electrode processes and plasma properties
Thin Films and Coatings -- preparation, characterization, and utilization
Vacuum Arc Deposition -- equipment, processes, and coatings: research, development and design
Carbon nano-tubes and other nano-particles: synthesis, characterization, and applications

For more information, see:

Sam and Ray's keynote paper at THIN FILMS 2008 (Singapore, July 2008) "TRANSPARENT CONDUCTING OXIDE THIN FILMS: PHYSICS, CURRENT STATUS, AND FUTURE PROSPECTS"
Electrical Discharge and Plasma Laboratory home page
Biographical Sketch
List of publications
Ray's book: Handbook of Vacuum Arc Science and Technology
Ray chaired the International Conference on Superhard Coatings, 27 Feb. - 2 March, 2006
Ray's course on "Technical Writing in English"
Ray's tutorial "HOW TO WRITE A GOOD PAPER"
Ray's Tutorial "How to give a good lecture and present a poster"
lectureRay's lecture on how to write a winning research proposal (in Hebrew).


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[ Department of Interdisciplinary Studies | Faculty of Engineering ]

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Please send comments or questions about this page to: < boxman@eng.tau.ac.il>
Last modified: Mon May 8 2017